This table lists the nominal performance of our SEMs.
The actual performance depends on the specific sample and operator skills.
| Jeol IT500 | Tescan Vega | Zeiss Ultra plus | Zeiss Crossbeam 540 | Leo 1450 | Zeiss Ultra 55 | |
| Emitter | Tungsten filament | Tungsten filament | Schottky FEG | Schottky FEG | Tungsten filament | Schottky FEG |
| Detectors | SE, BSE, VPSE | SE, BSE | SE, In-column SE, BSE, ESB, AsB, STEM | SE, In-column SE, ESB, STEM | SE, In-column SE, BSE, AsB | |
| Resolution | 3.0 nm @ 30kV, 15.0 nm @ 1kV | 3.0 nm @ 30kV | 0.8 nm @ 30kV, 1.6 nm @ 1kV | 0.7 nm @ 30kV, 0.9 nm @ 15kV, 1.8 nm @ 1kV |
3.5 nm @ 30kV | 0.8 nm @ 30kV, 1.6 nm @ 1kV |
| Analytical detectors | EDX (JEOL) | EDX (Bruker) | EDX (Oxford), ESBD (Oxford) | (EDX (Oxford), EBIC (Kleindiek) | ||
| Special | Gallium Focused Ion Beam | Alemnis In-situ nanoindenter | Raith e-beam lithography | |||
| Multi GIS: Pt, C, XeF, N2, SiO2 | ||||||
| Variable pressure | Yes, up to 500 Pa | Yes, up to 150 Pa | No, local charge compensation with N2 possible | No, local charge compensation with N2 possible | No | No |