Tampere University has well-established micro- and nanofabrication facilities.
Micro- and nanofabrication (Login needed)
The Engineering and Natural Sciences department hosts two cleanrooms (ISO 5 and ISO 7). The laboratories include instruments for thin-film deposition, dry etching, wet processing, annealing and electron microscopy. Photolithography (SuSS MA6), UV-nanoimprinting (EVG 620) and electron-beam lithography (Raith ElphyPLUS) are possible. Everything from the simulation of photonics nanostructures to semiconductor growth, wafer patterning and characterization can be done in house.
Microscopy center
The Tampere Microscopy Center (TMC) provides intruments and services for the analysis of materials and nanostructures for both researchers and the industry. Characterization techniques include, for example, SEM, TEM, AFM, and Raman microscopy.
Surface science laboratory
The Surface science lab facilities are equipped with various sample preparation and surface modification methods. Methods include photoelectron spectroscopy, photoemission electron microscopy and atomic layer deposition (ALD).
Molecular-beam epitaxy
ORC infrastructure includes five molecular beam epitaxy systems equipped for the growth of all common GaAs, InP, and GaSb-based materials as well as more exotic III-V compounds.