Tampere University has well-established micro- and nanofabrication facilities. Most tasks starting from the simulation of photonics nanostructures to semiconductor growth, wafer patterning and chip characterization can be done in house.
Micro- and nanofabrication
Our main activities take place in two cleanrooms (ISO 5 and ISO 7) within the Engineering and Natural Sciences department. The laboratories include instruments for lithography: electron-beam lithography (Raith ElphyPLUS), photolithography (SuSS MA6) and UV-nanoimprinting (EVG 620). Other facilities include thin-film deposition, dry etching, wet processing, annealing and electron microscopy.
III-V compounds by Molecular-Beam Epitaxy
Our collaboration with ORC enables utilization of molecular-beam epitaxy systems equipped for the growth of all common GaAs, InP, and GaSb-based materials as well as more exotic III-V compounds.
Microscopy center
The Tampere Microscopy Center (TMC) provides intruments and services for the analysis of materials and nanostructures for both researchers and the industry. Characterization techniques include, for example, SEM, TEM, AFM, and Raman microscopy.
Surface science laboratory
The Surface science lab facilities are equipped with various sample preparation and surface modification methods. Methods include photoelectron spectroscopy, photoemission electron microscopy and atomic layer deposition (ALD).