The Multilab/Argus Electron Spectrometer includes Selected-area and Imaging X-ray Photoelectron Spectroscopy (SAXPS/iXPS). The UHV system is modular including also preparation chambers equipped with various sample preparation facilities.
Multilab/Argus Electron Spectrometer at a glance
| Measurement modes |
- X-ray Photoelectron Spectroscopy (XPS)
- Selected-area XPS (SAXPS)
- Imaging XPS (iXPS)
- X-ray Auger Electron Spectroscopy (XAES)
|
Aperture/
Analysis area/
Lateral resolution/
Typical application |
- A1 / ∅ 0.066 mm / 54 μm / High resolution iXPS
- A2 / ∅0.198 mm / 136 μm / Medium resolution iXPS
- A3 / 0.311 × 3.22 mm² / Snapshot mode
- A4 / ∅ 1.93 mm / 1.11 mm / SAXPS
- A5 / 1.54 × 4.09 mm² / High count rate SAXPS
- A6 / 1.23 × 4.66 mm² / Maximum count rate SAXPS
|
| Exitation sources |
- Al Kα X-ray source (1486.6 eV)
- Mg Kα X-ray source (1253.6 eV)
|
| Analyser and detector |
- Argus hemispherical electron analyser
- Microchannel plate electron multipliers and a 128 channel stripe anode detector
|
Sample preparation
options |
- Ar ion sputtering for surface cleaning and depth profiling
- Activated nitrogen ion bombardment
- Gas exposure (O2, H2O, air etc.)
- Oxidation/Reduction
- Physical vapour deposition (PVD)
- Electrospraying
- Annealing up to 800 °C (also during XPS measurement)
|
Sample
dimesions |
- Diameter: up to 1″
- Thickness: <5 mm
- Holder also for powder samples
|
